Acid-Labile Protecting Group
CAS Number: 80-62-6
Acid-Labile Protecting Group is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
Technical Specifications
| purity | ≥99.9% |
| metal ions | <1 ppb |
| sensitivity | UV/e-beam |
| particle size | <0.1 μm |
Applications
- Semiconductor manufacturing
- PCB fabrication
- MEMS fabrication
- Flat panel display
- Advanced packaging
Key Features
- High resolution patterning with Acid-Labile Protecting Group
- Ultra-high purity
- Excellent sensitivity
- Stable shelf life
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CAS Number
80-62-6
Category
Photoresist / PhotochemicalsAvailability
In StockSample
Dispatched within 5 days