Photoresist / Photochemicals
Explore our Photoresist / Photochemicals chemical additives sourced from qualified Chinese manufacturers — competitive pricing, reliable quality. 49 products available.
photoresist photochemicals
Acid-Labile Protecting Group
CAS: 80-62-6
Acid-Labile Protecting Group is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Anti-Reflective Coating ARC
CAS: 9003-01-4
Anti-Reflective Coating ARC is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Aqueous Alkaline Developer
CAS: 1310-73-2
Aqueous Alkaline Developer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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ArF Photoresist Resin
CAS: 9003-01-4
ArF Photoresist Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Bis-Azide Sensitizer
CAS: 621-71-6
Bis-Azide Sensitizer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Bottom ARC BPSG
CAS: 12008-41-2
Bottom ARC BPSG is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Carbon Hard Mask
CAS: 7440-44-0
Carbon Hard Mask is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Cast Solvent PGMEA
CAS: 108-65-6
Cast Solvent PGMEA is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Cationic Photoresist Resin
CAS: 25036-25-3
Cationic Photoresist Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Cyclopentanone Resist Solvent
CAS: 120-92-3
Cyclopentanone Resist Solvent is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Deep UV Photosensitizer
CAS: 50-14-6
Deep UV Photosensitizer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Developer TMAH
CAS: 75-59-2
Developer TMAH is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Dry Film Photoresist
CAS: 25036-25-3
Dry Film Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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EUV Photoresist Material
CAS: 25035-69-2
EUV Photoresist Material is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Edge Bead Remover
CAS: 67-64-1
Edge Bead Remover is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Electron Beam Resist
CAS: 25035-69-2
Electron Beam Resist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Epoxy SU-8 Photoresist
CAS: 28906-96-9
Epoxy SU-8 Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Fluorinated Photoacid Generator
CAS: 29420-49-3
Fluorinated Photoacid Generator is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Fluoropolymer Photoresist
CAS: 9002-84-0
Fluoropolymer Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Fluoropolymer Topcoat
CAS: 9002-84-0
Fluoropolymer Topcoat is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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I-Line Photoresist
CAS: 9003-01-4
I-Line Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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KrF Photoresist
CAS: 25036-25-3
KrF Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Lift-Off Photoresist
CAS: 9003-01-4
Lift-Off Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Nanoimprint Resin
CAS: 80-62-6
Nanoimprint Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Near-IR Sensitizer
CAS: 147-14-8
Near-IR Sensitizer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Negative Photoresist Resin
CAS: 25036-25-3
Negative Photoresist Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Onium Salt Photoinitiator
CAS: 66992-89-0
Onium Salt Photoinitiator is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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PEB Quencher Amine
CAS: 100-51-6
PEB Quencher Amine is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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PMMA Electron Resist
CAS: 9011-14-7
PMMA Electron Resist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoacid Generator PAG
CAS: 4170-30-3
Photoacid Generator PAG is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photobase Generator PBG
CAS: 143-22-6
Photobase Generator PBG is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photocurable Epoxy Monomer
CAS: 2426-07-5
Photocurable Epoxy Monomer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoresist Adhesion Promoter HMDS
CAS: 999-97-3
Photoresist Adhesion Promoter HMDS is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoresist Backside Coating
CAS: 25035-69-2
Photoresist Backside Coating is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoresist Baking Additive
CAS: 25035-69-2
Photoresist Baking Additive is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoresist Leveling Additive
CAS: 9003-01-4
Photoresist Leveling Additive is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoresist Stripping Solvent
CAS: 872-50-4
Photoresist Stripping Solvent is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Photoresist Thinner
CAS: 108-65-6
Photoresist Thinner is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Positive Photoresist Resin
CAS: 9003-01-4
Positive Photoresist Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Resist Dissolution Inhibitor
CAS: 25985-97-9
Resist Dissolution Inhibitor is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Rinse Solution Photolithography
CAS: 7732-18-5
Rinse Solution Photolithography is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Sensitizer Diazonaphthoquinone
CAS: 944-07-4
Sensitizer Diazonaphthoquinone is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Silicon-Containing Resist
CAS: 63148-62-9
Silicon-Containing Resist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Silicone Anti-Reflective
CAS: 63148-62-9
Silicone Anti-Reflective is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Spin-On Dielectric
CAS: 25035-69-2
Spin-On Dielectric is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Spin-On Glass SiO2
CAS: 7631-86-9
Spin-On Glass SiO2 is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Thermal Acid Generator
CAS: 4170-30-3
Thermal Acid Generator is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Top Anti-Reflective Coating TARC
CAS: 25036-25-3
Top Anti-Reflective Coating TARC is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Wafer Cleaning SC1 Chemical
CAS: 1336-21-6
Wafer Cleaning SC1 Chemical is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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