PMMA Electron Resist
CAS Number: 9011-14-7
PMMA Electron Resist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
Technical Specifications
| purity | ≥99.9% |
| metal ions | <1 ppb |
| sensitivity | UV/e-beam |
| particle size | <0.1 μm |
Applications
- Semiconductor manufacturing
- PCB fabrication
- MEMS fabrication
- Flat panel display
- Advanced packaging
Key Features
- High resolution patterning with PMMA Electron Resist
- Ultra-high purity
- Excellent sensitivity
- Stable shelf life
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CAS Number
9011-14-7
Category
Photoresist / PhotochemicalsAvailability
In StockSample
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