Photoresist Stripper
CAS Number: 872-50-4
Photoresist stripper is a solvent or alkaline aqueous solution used to remove photoresist films from semiconductor wafers, PCBs, and flat panel display substrates after patterning and etching steps. It must completely dissolve or lift off both exposed and unexposed resist without damaging underlying metal layers or dielectrics. Available in NMP-based, solvent-blend, and aqueous alkaline formulations for various resist types.
Technical Specifications
| bathLife | >30 g/L resist loading capacity |
| stripRate | >5 µm/min at 65°C |
| appearance | Clear to slightly amber liquid |
| solventBase | NMP, DMSO, or aqueous alkaline |
| operatingTemp | 50–80°C |
| metalCorrosion | <2 Å/min on Al, Cu |
Applications
- Semiconductor wafer photoresist stripping
- PCB dry film photoresist removal
- Flat panel display TFT array stripping
- MEMS device patterning resist removal
- Post-ion-implant resist strip
Key Features
- Complete removal of positive and negative photoresists
- Non-corrosive to aluminum, copper, and dielectric layers
- Long bath life for cost-effective operation
- NMP-free formulations available for environmental compliance