Photoresist / Photochemicals
49 products
Photoresist / Photochemicals
Photoresists, developers and strippers for lithography and PCB processes
49 products
49 products
photoresist photochemicals
Acid-Labile Protecting Group
CAS: 80-62-6
Acid-Labile Protecting Group is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Anti-Reflective Coating ARC
CAS: 9003-01-4
Anti-Reflective Coating ARC is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Aqueous Alkaline Developer
CAS: 1310-73-2
Aqueous Alkaline Developer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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ArF Photoresist Resin
CAS: 9003-01-4
ArF Photoresist Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Bis-Azide Sensitizer
CAS: 621-71-6
Bis-Azide Sensitizer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Bottom ARC BPSG
CAS: 12008-41-2
Bottom ARC BPSG is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Carbon Hard Mask
CAS: 7440-44-0
Carbon Hard Mask is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Cast Solvent PGMEA
CAS: 108-65-6
Cast Solvent PGMEA is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Cationic Photoresist Resin
CAS: 25036-25-3
Cationic Photoresist Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Cyclopentanone Resist Solvent
CAS: 120-92-3
Cyclopentanone Resist Solvent is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Deep UV Photosensitizer
CAS: 50-14-6
Deep UV Photosensitizer is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Developer TMAH
CAS: 75-59-2
Developer TMAH is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Dry Film Photoresist
CAS: 25036-25-3
Dry Film Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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EUV Photoresist Material
CAS: 25035-69-2
EUV Photoresist Material is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Edge Bead Remover
CAS: 67-64-1
Edge Bead Remover is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Electron Beam Resist
CAS: 25035-69-2
Electron Beam Resist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Epoxy SU-8 Photoresist
CAS: 28906-96-9
Epoxy SU-8 Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Fluorinated Photoacid Generator
CAS: 29420-49-3
Fluorinated Photoacid Generator is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Fluoropolymer Photoresist
CAS: 9002-84-0
Fluoropolymer Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Fluoropolymer Topcoat
CAS: 9002-84-0
Fluoropolymer Topcoat is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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I-Line Photoresist
CAS: 9003-01-4
I-Line Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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KrF Photoresist
CAS: 25036-25-3
KrF Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Lift-Off Photoresist
CAS: 9003-01-4
Lift-Off Photoresist is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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Nanoimprint Resin
CAS: 80-62-6
Nanoimprint Resin is a high-purity photochemical used in semiconductor lithography and PCB manufacturing. Provides precise pattern definition, excellent sensitivity, and compatibility with advanced photolithography processes.
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