TMAH Photoresist Developer
CAS Number: 75-59-2
TMAH (tetramethylammonium hydroxide) photoresist developer is the industry-standard aqueous alkaline developer for positive-tone photoresists in semiconductor and flat panel display manufacturing. It precisely develops exposed resist regions without leaving metallic ion contamination, making it compatible with CMOS processes. Supplied as 2.38% standard concentration for most photoresist systems, with alternative concentrations for specialized processes.
Technical Specifications
| pH | 12.5–13.5 |
| TOC | <1 ppm |
| metalIons | <1 ppb (Na, K, Ca, Fe per ion) |
| particles | <50 particles/mL >0.2 µm |
| appearance | Clear, colorless solution |
| TMAHConcentration | 2.38 wt% (standard) |
Applications
- KrF and ArF photoresist development
- g-line and i-line resist development
- EUV resist development
- Flat panel display TFT photolithography
- MEMS patterning development
Key Features
- Metal-ion-free for CMOS process compatibility
- Consistent development uniformity across wafer
- Standard 2.38% concentration for broad resist compatibility
- Ultra-high purity with sub-ppb metal contamination