Hydrochloric Acid Semiconductor Grade (HCl 37%)
CAS Number: 7647-01-0
Semiconductor grade hydrochloric acid (37%) is a critical chemical in RCA SC-2 cleaning for metal ion removal and oxide stripping. It forms complexes with heavy metals and removes them from wafer surfaces, and is used in HCl/H2O2/H2O (SC-2) mixtures to eliminate alkali metals and heavy metal contamination before oxidation furnace steps.
Technical Specifications
| appearance | Colorless to faint yellow clear liquid |
| purity (%) | ≥37.0 (HCl assay) |
| sulfate (SO4) | ≤0.1 ppm |
| free chlorine (Cl2) | ≤0.1 ppm |
| metallic impurities | ≤1 ppb each (SEMI C4 grade) |
Applications
- SC-2 (RCA-2) metal contamination removal clean
- Heavy metal and alkali ion decontamination
- Pre-oxidation furnace wafer clean
- Gold and platinum metal etching
- Aqua regia (HCl/HNO3) formulation
Key Features
- SEMI C4 ultra-pure grade for RCA-2 SC-2 cleaning process
- Excellent metal complexing ability for ion removal from Si surfaces
- Low sulfate and iron content prevents gate oxide reliability issues
- Supplied in HDPE or quartz containers for maximum purity preservation
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CAS Number
7647-01-0
Category
Semiconductor Etching ChemicalsAvailability
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