Ammonium Hydroxide Semiconductor Grade (NH4OH SC-1)
CAS Number: 1336-21-6
Semiconductor grade ammonium hydroxide (28–30% NH3) is a key component of the RCA SC-1 cleaning solution (NH4OH/H2O2/H2O) used for particle and organic contamination removal from silicon wafers. It also performs light silicon oxide etching to undercut and lift particles. Its ultra-pure quality prevents the introduction of metallic contamination during critical pre-gate-oxide cleaning.
Technical Specifications
| appearance | Colorless clear liquid |
| purity (%) | ≥28.0 (NH3 assay) |
| chloride (Cl-) | ≤0.1 ppm |
| metallic impurities | ≤1 ppb each (SEMI C5 grade) |
| non-volatile residue | ≤1 ppm |
Applications
- SC-1 (APM) particle and organic removal clean
- Pre-gate oxide RCA clean sequence
- Silicon oxide light etch for particle lift-off
- TMAH-based developer additive
- Ammonia-peroxide mixture (APM) for CMP post-clean
Key Features
- SEMI C5 ultra-pure grade for critical SC-1 RCA cleaning sequences
- Controlled NH3 content ensures reproducible SC-1 etch rate and particle removal
- Low non-volatile residue prevents surface staining after cleaning
- Supplied in sealed HDPE containers with cold-chain shipping capability
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CAS Number
1336-21-6
Category
Semiconductor Etching ChemicalsAvailability
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