Bottom Anti-Reflective Coating (BARC)
Bottom anti-reflective coating (BARC) is a spin-coated organic or inorganic layer applied beneath the photoresist to suppress standing waves and reflective notching caused by substrate reflectivity during UV and DUV lithography. By tuning film thickness and refractive index (n, k), BARC minimizes reflected light at the resist/substrate interface, improving CD uniformity, resolution, and depth-of-focus in high-volume manufacturing.
Technical Specifications
| appearance | Clear to amber spin-coat solution |
| purity (%) | ≥99.5 (polymer solids content) |
| film thickness | 20–100 nm (spin-speed controlled) |
| refractive index (n at 193nm) | 1.4–1.8 (tunable) |
| extinction coefficient (k at 193nm) | 0.3–0.6 (tunable) |
Applications
- 193nm ArF DUV lithography CD control
- 248nm KrF lithography standing wave suppression
- EUV and high-NA EUV patterning underlayer
- Metal and polysilicon reflective substrate control
- Multi-layer resist (MLR) process middle layer
Key Features
- Tunable optical constants for precise reflectivity control at any exposure wavelength
- Fast thermal crosslinking (200–250°C) prevents intermixing with overlying resist
- High dry etch rate enables clean etch-back without mask loading effects
- Compatible with standard TMAH development — opens with resist in single develop step
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