Positive Photoresist Developer CD-26 (TMAH 2.38%)
CAS Number: 75-59-2
CD-26 photoresist developer is a precisely formulated 2.38% tetramethylammonium hydroxide (TMAH) aqueous solution that is the industry-standard developer for positive tone novolac and chemically amplified photoresists. Metal-ion-free chemistry eliminates alkali metal contamination, and the precise TMAH concentration provides predictable, reproducible development contrast and CD control.
Technical Specifications
| appearance | Colorless clear liquid |
| pH (25°C) | 13.0–13.5 |
| purity (%) | ≥99.9 (TMAH assay at 2.38 wt%) |
| particles (≥0.2 µm) | ≤10 per mL |
| metallic impurities (Na, K, Fe) | ≤0.1 ppb each |
Applications
- Positive tone novolac photoresist development (g/i-line)
- Chemically amplified resist (CAR) development (DUV/EUV)
- MEMS and MEMS-adjacent patterning development
- Flat panel display TFT patterning development
- Wafer-level packaging (WLP) photolithography
Key Features
- Industry-standard 2.38% TMAH concentration for predictable CD control
- Metal-ion-free formulation prevents CMOS device threshold voltage shift
- Ultra-low particle count minimizes line-edge roughness and defects
- Compatible with puddle, spray, and immersion development tools
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CAS Number
75-59-2
Category
Semiconductor Etching ChemicalsAvailability
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