Propylene Glycol Monomethyl Ether Acetate (PGMEA)
CAS Number: 108-65-6
PGMEA (propylene glycol monomethyl ether acetate) is the dominant photoresist solvent used in advanced lithography processes for 193nm and EUV resist formulations. Its optimal evaporation rate, excellent resin solvency, and low toxicity make it the industry standard casting solvent for positive and negative tone resists. Ultra-pure semiconductor grade minimizes defects and ensures consistent film uniformity.
Technical Specifications
| appearance | Colorless clear liquid |
| purity (%) | ≥99.9 (GC assay) |
| water content | ≤100 ppm |
| metallic impurities | ≤0.1 ppb each (SEMI C7 grade) |
| non-volatile residue | ≤0.5 ppm |
Applications
- 193nm ArF and EUV photoresist casting solvent
- Chemically amplified resist (CAR) formulation
- Anti-reflective coating (ARC/BARC) solvent
- Spin-on dielectric and SOG formulation solvent
- Photoresist dilution for thin film control
Key Features
- SEMI C7 ultra-high purity grade for advanced node EUV lithography
- Optimized evaporation rate for uniform spin-coat film formation
- Lowest non-volatile residue ensures defect-free photoresist coatings
- Available in moisture-barrier packaging to maintain sub-100ppm water content
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CAS Number
108-65-6
Category
Semiconductor Etching ChemicalsAvailability
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