Hydrogen Peroxide Semiconductor Grade (H2O2 30%)
CAS Number: 7722-84-1
Semiconductor grade hydrogen peroxide (30%) is an essential oxidizing agent used in RCA SC-1 and SC-2 wafer cleaning processes to remove organic and ionic contamination. When mixed with ammonium hydroxide (SC-1) it removes particles and organics; with HCl (SC-2) it dissolves metal ions. It is also a key component of SPM piranha cleaning.
Technical Specifications
| appearance | Colorless clear liquid |
| purity (%) | ≥30.0 (H2O2 assay) |
| stabilizer | ≤100 ppm (phosphate-free grades available) |
| total carbon (TOC) | ≤100 ppb |
| metallic impurities | ≤1 ppb each (SEMI C3 grade) |
Applications
- SC-1 (NH4OH/H2O2/H2O) particle and organic removal
- SC-2 (HCl/H2O2/H2O) metal contamination clean
- SPM (H2SO4/H2O2) photoresist strip
- Surface oxidation for passivation
- Copper CMP post-clean oxidizing rinse
Key Features
- SEMI C3 ultra-pure grade compatible with all RCA cleaning sequences
- Stabilizer-free grades available for critical gate oxide processes
- Low TOC minimizes organic recontamination during cleaning
- Supplied chilled in HDPE containers with pressure-relief caps
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CAS Number
7722-84-1
Category
Semiconductor Etching ChemicalsAvailability
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