N-Methyl-2-Pyrrolidone Semiconductor Grade (NMP)
CAS Number: 872-50-4
Semiconductor grade N-Methyl-2-Pyrrolidone (NMP) is a high-boiling polar aprotic solvent widely used as a photoresist stripper and residue remover in back-end-of-line (BEOL) processes. Its excellent solvency for cross-linked resists and low vapor pressure make it ideal for single-wafer spin-clean tools and immersion strip baths. Ultra-pure grade ensures no metallic contamination of interconnect layers.
Technical Specifications
| appearance | Colorless clear liquid |
| purity (%) | ≥99.9 (GC assay) |
| water content | ≤500 ppm |
| metallic impurities | ≤1 ppb each |
| non-volatile residue | ≤2 ppm |
Applications
- Post-etch photoresist strip in BEOL processes
- Cross-linked resist and polymer residue removal
- Polyimide coating and patterning solvent
- Ionic liquid extraction and cleaning solvent
- ELO (edge lift-off) process solvent
Key Features
- Excellent solvency for cross-linked and ion-implanted photoresists
- High boiling point (202°C) enables elevated-temperature strip processes
- Low vapor pressure reduces solvent loss and improves worker safety
- Compatible with amines and co-solvents for enhanced strip formulations
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CAS Number
872-50-4
Category
Semiconductor Etching ChemicalsAvailability
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