Nitric Acid Semiconductor Grade (HNO3 69%)
CAS Number: 7697-37-2
Semiconductor grade nitric acid (69%) is used in silicon etching chemistry, metal surface oxidation, and wafer cleaning processes. In combination with HF, it forms the standard silicon etch mixture (HNA: HF/HNO3/HAc) for isotropic silicon etching. Its ultra-pure formulation meets SEMI C1 standards with trace metal content below 1 ppb.
Technical Specifications
| appearance | Colorless to faint yellow clear liquid |
| purity (%) | ≥69.0 (HNO3 assay) |
| sulfate (SO4) | ≤0.1 ppm |
| chloride (Cl-) | ≤0.1 ppm |
| metallic impurities | ≤1 ppb each (SEMI C1 grade) |
Applications
- HNA (HF/HNO3/acetic acid) isotropic silicon etching
- Metal surface oxidation and passivation
- Piranha (SPM) solution component
- Aluminum and titanium metal etching
- Wafer surface organic contamination removal
Key Features
- SEMI C1 ultra-pure grade suitable for critical FEOL wet processes
- Strong oxidizing capability for effective silicon surface passivation
- Low color and low NOx content for clean-room compatibility
- Available in stabilized formulation to minimize decomposition
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CAS Number
7697-37-2
Category
Semiconductor Etching ChemicalsAvailability
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