Ethylene Glycol Monobutyl Ether (EGBE) Developer Solvent
CAS Number: 111-76-2
Semiconductor grade ethylene glycol monobutyl ether (EGBE, also known as butyl cellosolve) is used as a co-solvent in photoresist developer formulations and as a cleaning agent for equipment and fixtures. Its moderate evaporation rate and compatibility with aqueous alkaline developers make it useful in optimizing developer spreading and uniformity on wafer surfaces.
Technical Specifications
| appearance | Colorless clear liquid |
| purity (%) | ≥99.5 (GC assay) |
| water content | ≤300 ppm |
| metallic impurities | ≤1 ppb each |
| acidity (as acetic acid) | ≤10 ppm |
Applications
- Co-solvent in aqueous alkaline photoresist developers
- Wetting agent for improved developer uniformity
- Cleaning solvent for photoresist spin coaters
- Surfactant formulation co-solvent
- Screen printing and lithography cleaning
Key Features
- Moderate evaporation rate for improved process latitude in development
- Fully miscible with water and common photoresist solvents
- Low metallic impurities prevent photoresist adhesion degradation
- Effective wetting performance on hydrophobic wafer surfaces
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CAS Number
111-76-2
Category
Semiconductor Etching ChemicalsAvailability
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